| B | |||
| B | Boron; Flux density | ||
| B2O3 | Boric oxide | ||
| Ba | Barium | ||
| BACT | Best Available Control Technology | ||
| BASE | Boston Area Semiconductor Education (Council) | ||
| Baud | Signal level changes | ||
| BAW | Bulk Acoustic Wave | ||
| BC | Bias Contrast; Bond Centered; Buired Capacitance | ||
| BCAD | Business Computer-Aided Design | ||
| BCC | Body Centered Cubic | ||
| BCD | Binary Coded Decimal | ||
| BCP | Biphase Communications Processor | ||
| BCS | Bardeen Cooper Schriefer | ||
| BDEV | Behavior-level DEViation | ||
| BDMA | BenzylDiMethylAmine | ||
| BDS | Brownian Dynamics Simulation | ||
| Be | Beryllium | ||
| BE | Boundary Element; Bound Exciton; Band Edge | ||
| BEC | Bose Einstein Condensation | ||
| BEEM | Ballistic Electron Emmission Spectroscopy | ||
| BEEP | Block Extensible Exchange Protocol | ||
| BEM | BE Method | ||
| BENU | Bull's Eye Non-Uniformity | ||
| BEOL | Back-End Of Line | ||
| BER | Bit Error Rate | ||
| BESOI | Bonded and Etchback SOI | ||
| BET | Brunauer, Emmett, Teller | ||
| BF | Brightfield | ||
| BFGS | Broyden-Fletcher-Goldfarb-Shanno optimization algorithm | ||
| BFL | Buffered Field-effect-transistor Logic | ||
| BFN | Beam Forming Network | ||
| BFO | Beat Frequency Oscillator | ||
| BG | Band Gap | ||
| BGA | Ball Grid Array | ||
| BGE | Band Gap Engineering | ||
| BHF | Buffered Hydro Fluoric (acid) | ||
| BHT | Brinell Hardness Test | ||
| Bi | Bismuth | ||
| BI | Burn In | ||
| BICMOS | BIpolar Complementary Metal-Oxide Semiconductor | ||
| BIFET | Bipolar Field-Effect Transistor | ||
| BIM | Binary Intensity Mask | ||
| BIMOS | Bipolar Metal-Oxide Semiconductor | ||
| BIS | Built-In Simulation | ||
| BIST | Built-In Self Test | ||
| BIT | Bulk Ion Temperature; Built-In Test | ||
| BITE | Built-In Test Equipment | ||
| BJT | Bipolar Junction Transistor | ||
| Bk | Berkelium | ||
| BLD | Beam Lead Device | ||
| BLEVE | Boiling Liquid Expanding Vapor Explosion | ||
| BMC | Bubble Memory Controller | ||
| BMP | Windows or OS/2 Bitmap image format | ||
| BNC | Bayonet Nut Coupling | ||
| BOD | Biochemical Oxygen Demand | ||
| BOE | Buffered Oxide Etchant | ||
| BOM | Bill Of Material | ||
| BOR | Bottom Of Range | ||
| BOSS | Book Of SEMI Standards; Binary Object Storage System | ||
| BOX | Buried OXide | ||
| BPF | Band Pass Filter | ||
| BPR | Business Process Re-engineering | ||
| BPS | Bits Per Second | ||
| BPSG | Boro PhosphoSilicate | ||
| BPSK | Binary Phase Shift Keying | ||
| BPTEOS | BoroPhosphosilicate glass from a TEOSÔ (TM of NALCO Chem. Comp) | ||
| Br | Bromine | ||
| BSE | BackScaterred Electrons | ||
| BST | Barium Strontium Titanate; Bandwidth Segmented Transmission | ||
| BT | Bismaleimide Triazine; British Telecom | ||
| BTAB | Bumped Tape Automated Bonding | ||
| BTD | Bistable Thermal Donors | ||
| BTE | Boltzmann Transport Equation | ||
| BTS | Base Transceiver Systems | ||
| BV | Breakdown Voltage | ||
| BW | BandWidth | ||
| BWO | Backward Wave Oscillator | ||
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